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AURORA, Ill., Oct. 20, 2010 (GLOBE NEWSWIRE) -- Cabot Microelectronics Corporation (Nasdaq:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries and growing ...

The federal Environmental Protection Agency says Central Maine Power’s permit application now being reviewed by the U.S. Army Corps of Engineers for its controversial New England Clean Energy Connect ...

The Centers for Medicare & Medicaid Services has paused most grants distributed from its civil monetary penalty reinvestment program, leaving some nursing home leaders without a much-needed funding ...

PHILADELPHIA--(BUSINESS WIRE)--Dow Electronic Materials, a business unit of The Dow Chemical Company (NYSE:DOW), today introduced its new IKONIC™ polishing pad platform, bringing to market Dow’s most ...

Producing high-purity wafers via the CMP process is a critical application and the halting of harmful slurry-DIW ...

SANTA CLARA, Calif.--(BUSINESS WIRE)--Applied Materials, Inc. today announced the shipment of its 2,500 th CMP 1 system, marking a major milestone in the industry and ten consecutive years of CMP ...

Until the publication of the Enterprise JavaBeans 3.0 specification and the Java Persistence API, the only persistence technology officially part of the Java Enterprise Edition platform (Java EE is ...

Public cloud or private cloud? Amazon or Azure? There once was a time when you could go to any bar in Las Vegas after a day of trade shows and hear people debating such topics, sometimes with great ...