ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

Fast, high uniformity and superb coating quality – these properties not only apply to physical vapor deposition methods but also to atomic layer deposition (ALD). Espoo, Finland-based developer of ALD ...

For plastics manufacturing, petroleum refining, food and biofuel production and numerous other core chemical manufacturing processes, heterogeneous catalysts are crucial. Thermal degradation or ...

We first developed a virtual device structure to test how ALD thickness affects hole size uniformity and CD. We started our virtual experiment by using two crisscross SAQP processes and transferring a ...

Atomic layer deposition (ALD) is a bottom-up nanofabrication deposition method that technically falls within the remit of chemical vapor deposition (CVD) methods; but it has become well-regarded as a ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...